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簡(jiǎn)要描述：The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition （CVD） process.
產(chǎn)品型號：2D Semiconductor 廠(chǎng)商性質(zhì)：生產(chǎn)廠(chǎng)家更新時(shí)間：2024-06-03訪(fǎng) 問(wèn) 量：1351詳細介紹
The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition (CVD) process. Nickel (Ni) foams were created by acid reaction at high temperatures, followed by 4-step CVD graphene growth process. Overall, few-layers and single-layers of graphene is deposited onto Ni walls after reacting C2H4 gas with H2 gases. These materials are ideal for gas separation, catalysis, gas detection, sensory applications.
The 3D Graphene Foam is deposited comformably onto Nickel foam foils by chemical vapor deposition (CVD) process. Nickel (Ni) foams were created by acid reaction at high temperatures, followed by 4-step CVD graphene growth process. Overall, few-layers and single-layers of graphene is deposited onto Ni walls after reacting C2H4 gas with H2 gases. These materials are ideal for gas separation, catalysis, gas detection, sensory applications.
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